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Lithography Enhancement towards Nano Scale (LENS)
Date du début: 1 janv. 2009, Date de fin: 1 déc. 2011,
Water immersion lithography has been widely accepted as patterning technology for the 45nm technology node, but solutions for the patterning of 32nm and 22nm technology nodes are not clear yet.EUV lithography is not yet available for industrial use, in spite of the impressive progresses registered till now, while multiple beam e beam lithography is still in development. Double patterning seems to ...
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