"In the past decade, it has become increasingly recognized that low-energy electrons (LEE) play a key role in a large number of fundamental and applied fields. Electrons with energies in the range 0-30 eV can induce, at interfaces and surfaces, specific reactions which are relevant to nanolithography, dielectric aging, radiation waste management, radiation processing, astrochemistry, planetary and atmospheric chemistry, surface photochemistry, radiobiology, and radiotherapy. For more than 30 years, the action of LEE at the surface of molecular and biomolecular solids has been investigated in the laboratory of the applicant with model systems consisting of pure or doped thin molecular films. The purpose of the present application is to develop a research program within the European Union (EU) to investigate systems of relevance to three important applications of LEE processing, namely nanolithography, astrochemsitry and radiotherapy. In particular we plan (1) To investigate LEE-induced reactions of selected molecules on metallic surfaces so as to assess their potential for STM beam lithography. (2) To study the possibility of inducing specific chemical reactions with the photoelectrons. (3)To investigate LEE-induced reactions in ice mantles that simulate both planetary and ISM conditions. (4)To investigate LEE-induced damage to DNA incorporating the radiosensitizers Carboplatin and Gemcitabine with and without added water. (5)To obtain cross sections for DNA damage with and without the presence of these radiosensitizers by analysing the dose to yields relationship during LEE bombardment of DNA. Since the IIF is one of world’s leading researchers in such LEE processes it is also intended to exploit his fellowship to provide valuable training and leadership amongst the younger members of the EU LEE community at a time when a new generation of researchers is emerging in the field."