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MAsk less lithoGraphy for IC manufacturing (MAGIC) (MAGIC)
Date du début: 1 janv. 2008, Date de fin: 31 déc. 2010,
Description
MAGIC has supported the development of e-beam based maskless lithography technology in Europe: Two parallel lithography tool developments for 32nm CMOS and beyond and on lithography infrastructure.In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now driving solution to deal with all ...
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