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 TERMINÉ 

Gigascale Oriented Solid State flAsh Memory for EuRope (GOSSAMER)

Date du début: 1 janv. 2008, Date de fin: 30 juin 2011,

Description GOSSAMER successfully developed a fully integrated Flash NAND technology based on the TANOS concept, investigating a large number of architecture and material options. The project aimed at the development of the technology for very high density Non Volatile Memories for mass storage ap ...
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 TERMINÉ 

Investigation of Si wafer damage in manufacturing processes (SIDAM)

Date du début: 1 janv. 2008, Date de fin: 30 juin 2011,

Wafer handling in semiconductor manufacturing introduces microcracks at the wafer edge. During thermal processing, some of these grow into slip bands; on rapid thermal processing some of these grow into cracks, shattering the wafer and disrupting manufacture. Dense slip bands also lead to yield loss by locally increasing diffusion rates. Breakage losses alone were of the order of €2.5M p.a. for a ...
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