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Copper Interconnects for Advanced Performance and Reliability (CopPeR)

Date du début: 1 janv. 2008, Date de fin: 30 nov. 2010,

The CopPeR project will provide a novel copper deposition process based on the useof non-aqueous solvents to overcome the limitations of currently employedinterconnect formation processes enabling device scaling beyond the 32 nmtechnology node. This non-aqueous process will open novel routes to implementdirect on barrier plating, focussing on tantalum and ruthenium as diffusion barriers.As another ...
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