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Large Area Fabrication of 3D Negative Index Metamaterials by Nanoimprint Lithography (NIM_NIL)
Date du début: 1 sept. 2009, Date de fin: 31 août 2012,
Three-dimensional large area metamaterials, especially Negative Index Materials (NIMs) promise to enable numerous novel and breakthrough applications like perfect lenses and cloaking devices, not only but especially if they exhibit the desired properties in the visible frequency range. For the European Photonics industry it is of paramount importance enabling fabricating such materials as soon as ...
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